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Dopant Addition , Metallization and Packaging
Lesson 4 of 10 • 4 upvotes • 11:10mins
Sanjana Pedada
This lesson covers the following steps of IC Fabrication: Diffusion, Ion implantation, etching, epitaxial growth, Metallization and Packaging
VLSI Process Technology: GATE
10 lessons • 1h 50m
1
First step: Crystal Growth
9:11mins
2
Photolithography: For Pattern Generation
12:09mins
3
Oxidation and Methods of Oxidation
9:54mins
4
Dopant Addition , Metallization and Packaging
11:10mins
5
Fabrication of NMOS
11:35mins
6
Fabrication of CMOS - Part 1
10:37mins
7
Fabrication of CMOS - Part 2
11:15mins
8
Gate questions on VLSI (IC Fabrication) part 1
11:52mins
9
Gate questions on VLSI (IC Fabrication) Part 2
10:49mins
10
Gate questions on VLSI(IC Fabrication) Part 3
11:29mins
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